The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 13, 2021

Filed:

Oct. 16, 2018
Applicant:

Fujifilm Corporation, Tokyo, JP;

Inventors:

Masaaki Suzuki, Kanagawa, JP;

Tatsuya Iwasaki, Kanagawa, JP;

Katsuyuki Takada, Kanagawa, JP;

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B32B 5/30 (2006.01); B32B 27/20 (2006.01); B32B 27/08 (2006.01); G02B 1/14 (2015.01); G02F 1/1335 (2006.01); B32B 27/30 (2006.01); B32B 27/38 (2006.01); G02B 5/30 (2006.01); G02F 1/1333 (2006.01); G02F 1/13357 (2006.01); G06F 3/041 (2006.01); B29C 35/02 (2006.01); B82Y 30/00 (2011.01); C01B 33/12 (2006.01);
U.S. Cl.
CPC ...
B32B 5/30 (2013.01); B32B 27/08 (2013.01); B32B 27/20 (2013.01); B32B 27/308 (2013.01); B32B 27/38 (2013.01); G02B 1/14 (2015.01); G02B 5/3025 (2013.01); G02F 1/13338 (2013.01); G02F 1/133504 (2013.01); G02F 1/133528 (2013.01); G02F 1/133602 (2013.01); G06F 3/041 (2013.01); B29C 35/02 (2013.01); B32B 2264/102 (2013.01); B32B 2307/412 (2013.01); B32B 2307/746 (2013.01); B32B 2457/202 (2013.01); B82Y 30/00 (2013.01); C01B 33/12 (2013.01); C01P 2004/04 (2013.01); C01P 2004/64 (2013.01); C01P 2006/12 (2013.01); C09K 2323/03 (2020.08); C09K 2323/031 (2020.08); C09K 2323/033 (2020.08); G02B 5/3033 (2013.01); G02F 1/133502 (2013.01);
Abstract

A laminated film having a haze of 1.0% or less and including two kinds of silica particles (silica particles A and silica particles B) in a cured layer, wherein the occupied area proportion of the silica particles A on a cross-sectional TEM image of the cured layer is 0.5% to 20.0% and satisfies the following relationship with the occupied area proportion of the silica particles B: 0.005≤occupied area proportion of silica particles A/occupied area proportion of silica particles B≤0.400, the variation coefficient of the occupied area proportion of the silica particles A on the cross-sectional TEM image of the cured layer is more than 0.5% and 3.0% or less, and the variation coefficient of the occupied area proportion of the silica particles B is 0.0% to 0.5%; a production method thereof; a polarizing plate; a liquid crystal panel; a liquid crystal display; and a touch panel.


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