The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 13, 2021

Filed:

Nov. 30, 2017
Applicant:

Mitsubishi Hitachi Tool Engineering, Ltd., Tokyo, JP;

Inventor:

Tomoya Sasaki, Yasu, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B23B 27/14 (2006.01); B23B 51/00 (2006.01); B23C 5/16 (2006.01); B23D 43/00 (2006.01); B23D 77/00 (2006.01); B23F 21/00 (2006.01); C23C 14/06 (2006.01);
U.S. Cl.
CPC ...
B23B 27/14 (2013.01); B23B 51/00 (2013.01); B23C 5/16 (2013.01); B23D 43/00 (2013.01); B23D 77/00 (2013.01); B23F 21/00 (2013.01); C23C 14/06 (2013.01); B23B 2224/08 (2013.01); B23B 2224/36 (2013.01); B23B 2228/08 (2013.01); B23B 2228/24 (2013.01);
Abstract

A hard coating film of a coated cutting tool contains Al within a range of 70 at % to 80 at % and Ti within a range of 20 at % to 30 at % with respect to a total amount of metallic (including metalloid) elements, and contains Ar of 0.50 at % or less with respect to a total amount of the metallic elements (including metalloid) and nonmetallic elements. The film has a diffraction peak due to each of a TiN (111) plane, a TiN (200) plane, and a TiN (220) plane of an fcc structure and an AlN (100) plane and an AlN (002) plane of a hcp structure, in which the diffraction peak of the TiN (200) plane indicates a maximum intensity and an intensity of the diffraction peak due to the TiN (111) plane is next thereafter. The average crystal grain size is within a range of 5 nm to 50 nm.


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