The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 13, 2021
Filed:
Apr. 16, 2018
The Procter & Gamble Company, Cincinnati, OH (US);
Timothy Ian Mullane, Union, KY (US);
Kelyn Anne Arora, Cincinnati, OH (US);
Jill Marlene Orr, Liberty Township, OH (US);
Donald Carroll Roe, West Chester, OH (US);
Jennifer Schutte, Cincinnati, OH (US);
John Brian Strube, Okeana, OH (US);
Ann Cecilia Tapp, West Chester, OH (US);
Rachael Eden Walther, Union, KY (US);
Amanda Margaret Bicking, Cincinnati, OH (US);
Jennifer Lynn Dusold, Cincinnati, OH (US);
Margaret Elizabeth Porter, Cincinnati, OH (US);
The Procter & Gamble Company, Cincinnati, OH (US);
Abstract
A patterned apertured web includes a plurality of first arrays forming a first zone in the patterned apertured web. At least some of the first arrays include a first plurality of land areas and a first plurality of apertures. At least some of the first plurality of land areas surround at least some of the first plurality of apertures. The first plurality of apertures of the first zone have a plurality of Interaperture Distances, according to the Aperture Test. The Interaperture Distances of the first zone have a first distribution having a first mean and a first median. The first mean is greater than the first median by at least 4%.