The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 06, 2021

Filed:

Sep. 27, 2019
Applicant:

Keysight Technologies, Inc., Santa Rosa, CA (US);

Inventors:

Martin W. Dvorak, Santa Rosa, CA (US);

Rory R. Stine, Santa Rosa, CA (US);

Mathias Bonse, Santa Rosa, CA (US);

Shusen Huang, Santa Rosa, CA (US);

Assignee:

Keysight Technologies, Inc., Santa Rosa, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/304 (2006.01); H01L 29/66 (2006.01); H01L 21/02 (2006.01); H01L 21/67 (2006.01); H01L 21/20 (2006.01); H01L 21/321 (2006.01); H01L 21/3205 (2006.01); H01L 21/3213 (2006.01); H01L 21/78 (2006.01); H01L 29/737 (2006.01); H01L 21/603 (2006.01);
U.S. Cl.
CPC ...
H01L 29/66242 (2013.01); H01L 21/02293 (2013.01); H01L 21/02697 (2013.01); H01L 21/2007 (2013.01); H01L 21/304 (2013.01); H01L 21/3212 (2013.01); H01L 21/32051 (2013.01); H01L 21/32133 (2013.01); H01L 21/67075 (2013.01); H01L 21/7806 (2013.01); H01L 29/737 (2013.01); H01L 2021/603 (2013.01);
Abstract

A method of forming an HBT structure includes forming an HBT epitaxial layer structure over a first substrate wafer; performing a first substrate transfer of the HBT epitaxial layer structure and the first substrate wafer onto a second substrate wafer, including inverting the HBT epitaxial layer structure and the first substrate wafer; removing the first substrate wafer; forming a first subcollector metal layer over the HBT epitaxial layer structure; performing a second substrate transfer of the subcollector metal layer and the HBT epitaxial layer structure onto a third substrate wafer with a second subcollector metal layer, including inverting the subcollector metal layer and the epitaxial layer structure; compression bonding the first and second subcollector metal layers to provide a bonded subcollector metal layer; and removing the second substrate wafer. The HBT structure includes the third substrate wafer, the bonded subcollector metal layer, and the HBT epitaxial layer structure.


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