The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 06, 2021

Filed:

Nov. 03, 2014
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Michael Robert Rice, Pleasanton, CA (US);

Michael Meyers, San Jose, CA (US);

John J. Mazzocco, San Jose, CA (US);

Dean C. Hruzek, Cedar Park, TX (US);

Michael Kuchar, Georgetown, TX (US);

Sushant S. Koshti, Sunnyvale, CA (US);

Penchala N. Kankanala, San Ramon, CA (US);

Eric A. Englhardt, Palo Alto, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); H01L 21/677 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67196 (2013.01); H01L 21/67167 (2013.01); H01L 21/67184 (2013.01); H01L 21/67201 (2013.01); H01L 21/67742 (2013.01);
Abstract

A transfer chamber configured to be used during semiconductor device manufacturing is described. Transfer chamber includes at least one first side of a first width configured to couple to one or more substrate transfer units (e.g., one or more load locks or one or more pass-through units), and at least a second set of sides of a second width that is different than the first width, the second set of sides configured to couple to one or more processing chambers. A total number of sides of the transfer chamber is at least seven. Transfers within the transfer chamber are serviceable by a single robot. Process tools and methods for processing substrates are described, as are numerous other aspects.


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