The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 06, 2021
Filed:
May. 20, 2019
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Xuebin Li, Sunnyvale, CA (US);
Patricia M. Liu, Saratoga, CA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/285 (2006.01); H01L 21/02 (2006.01); H01L 21/67 (2006.01); H01L 21/28 (2006.01);
U.S. Cl.
CPC ...
H01L 21/28518 (2013.01); H01L 21/0228 (2013.01); H01L 21/02211 (2013.01); H01L 21/02255 (2013.01); H01L 21/28061 (2013.01); H01L 21/67017 (2013.01);
Abstract
Methods for depositing a metal silicide are provide and include heating a substrate having a silicon-containing surface to a deposition temperature, and exposing the substrate to a deposition gas to deposit a silicide film on the silicon-containing surface during a chemical vapor deposition process. The deposition gas contains a silicon precursor, a titanium or other metal precursor, and a phosphorus or other non-metal precursor.