The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 06, 2021

Filed:

Feb. 11, 2020
Applicant:

Nissin Ion Equipment Co., Ltd., Koka, JP;

Inventors:

Masakazu Adachi, Shiga, JP;

Yuya Hirai, Shiga, JP;

Tomoya Taniguchi, Shiga, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/08 (2006.01); H01J 37/30 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32412 (2013.01); H01J 37/08 (2013.01); H01J 37/3002 (2013.01); H01J 37/3288 (2013.01); H01J 37/32568 (2013.01); H01J 37/32798 (2013.01); H01J 37/32862 (2013.01);
Abstract

An ion source includes a plasma chamber, and a suppression electrode disposed downstream of the plasma chamber, and is operable to irradiate the suppression electrode with an ion beam produced from a cleaning gas to clean the suppression electrode. Prior to cleaning, the ion source moves the suppression electrode or the plasma chamber in a first direction to increase a distance between the plasma chamber and the suppression electrode.


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