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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10969686 B1

PDFFull Text
Date of Patent:
Apr. 06, 2021

Filed:

Jan. 31, 2017

Film mask, method for manufacturing same, and method for forming pattern using film mask and pattern formed thereby

Applicant:

Lg Chem, Ltd., Seoul, KR;

Inventors:

Ji Young Hwang, Daejeon, KR;

Han Min Seo, Daejeon, KR;

Sangcholl Han, Deajeon, KR;

Seung Heon Lee, Daejeon, KR;

Dong Hyun Oh, Daejeon, KR;

Dae Han Seo, Daejeon, KR;

Nam Seok Bae, Daejeon, KR;

Min Soo Song, Daejeon, KR;

Assignee:

LG CHEM, LTD., Seoul, KR;

Attorney:

Dentons US LLP

Primary Examiner:

Martin J Angebranndt

Int. Cl.
CPC ...
G03F 7/20 (2006.01); G03F 7/00 (2006.01); G03F 1/58 (2012.01); G03F 1/54 (2012.01); H01L 21/033 (2006.01);
U.S. Cl.
CPC ...
G03F 7/20 (2013.01); G03F 1/54 (2013.01); G03F 1/58 (2013.01); G03F 7/0002 (2013.01); G03F 7/0007 (2013.01); G03F 7/0017 (2013.01); G03F 7/0037 (2013.01); G03F 7/703 (2013.01); H01L 21/033 (2013.01); H01L 21/0332 (2013.01); H01L 21/0337 (2013.01);
Abstract

The present application relates to a film mask comprising: a transparent substrate; a darkened light-shielding pattern layer provided on the transparent substrate; and groove portions provided in a region where the darkened light-shielding pattern layer is not provided, a method for manufacturing the same, a method for forming a pattern by using the same, and a pattern manufactured by using the same.

Find Patent Forward Citations

Hwang, Ji. (2021). Film mask, method for manufacturing same, and method for forming pattern using film mask and pattern formed thereby (U.S. Patent No. 10969686). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10969686

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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