The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 06, 2021
Filed:
Jun. 21, 2017
H.e.f., Andrezieux Boutheon, FR;
Universite Jean Monnet Saint Etienne, Saint Etienne, FR;
Centre National DE LA Recherche Scientifique (Cnrs), Paris, FR;
H.E.F., Andrezieux Boutheon, FR;
Universite Jean Monnet Saint Etienne, Saint Etienne, FR;
Centre National De La Recherche Scientifique (CNRS), Paris, FR;
Abstract
The invention relates to a system () for producing an optical mask () for surface microtexturing, said system () comprising: a substrate () having a surface () that is to be textured; a layer of material () which covers the surface () of the substrate () and has an outer surface () that is exposed to the outside environment; and a generating and depositing device for generating and depositing droplets () on the outer surface () of the layer of material (), in a specific arrangement () under condensation, forming the optical mask () on the outer surface () of the layer of material (). The invention also relates to a treatment plant comprising a system () of said type. The invention further relates to a method for producing a mask as well as to a surface microtexturing method.