The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 06, 2021

Filed:

Jun. 21, 2017
Applicants:

H.e.f., Andrezieux Boutheon, FR;

Universite Jean Monnet Saint Etienne, Saint Etienne, FR;

Centre National DE LA Recherche Scientifique (Cnrs), Paris, FR;

Inventors:

Maxime Bichotte, Haguenau, FR;

Yves Jourlin, Saint Etienne, FR;

Laurent Dubost, Chamboeuf, FR;

Assignees:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/68 (2012.01);
U.S. Cl.
CPC ...
G03F 1/68 (2013.01);
Abstract

The invention relates to a system () for producing an optical mask () for surface treatment, in particular surface microtexturing, said system () comprising: a layer of material () which has an outer surface () that is exposed to the outside environment; and a generating and depositing device for generating and depositing droplets () on the outer surface () of the layer of material () in which a specific arrangement (), forming the optical mask () on the outer surface () of the layer of material (). The invention also relates to a treatment plant comprising a system () of said type. The invention further relates to a method for producing a mask as well as to a method for surface treatment.


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