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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10969677 B1

PDFFull Text
Date of Patent:
Apr. 06, 2021

Filed:

Jan. 31, 2017

Film mask, method for manufacturing same, and method for forming pattern using film mask

Applicant:

Lg Chem, Ltd., Seoul, KR;

Inventors:

Ji Young Hwang, Daejeon, KR;

Han Min Seo, Daejeon, KR;

Nam Seok Bae, Daejeon, KR;

Seung Heon Lee, Daejeon, KR;

Dong Hyun Oh, Daejeon, KR;

Chan Hyoung Park, Daejeon, KR;

Ki-Hwan Kim, Daejeon, KR;

Ilha Lee, Daejeon, KR;

Assignee:

LG CHEM, LTD., Seoul, KR;

Attorney:

Dentons US LLP

Primary Examiner:

Martin J Angebranndt

Int. Cl.
CPC ...
G03F 1/54 (2012.01); G03F 1/38 (2012.01); G03F 1/48 (2012.01); G03F 1/56 (2012.01); G03F 1/50 (2012.01); G03F 7/20 (2006.01); H01L 21/033 (2006.01);
U.S. Cl.
CPC ...
G03F 1/54 (2013.01); G03F 1/38 (2013.01); G03F 1/48 (2013.01); G03F 1/50 (2013.01); G03F 1/56 (2013.01); G03F 7/20 (2013.01); G03F 7/2014 (2013.01); G03F 7/703 (2013.01); G03F 7/7035 (2013.01); G03F 7/70791 (2013.01); H01L 21/033 (2013.01);
Abstract

The present application relates to a film mask including: a transparent substrate; a darkened light-shielding pattern layer provided on the transparent substrate; and a release force enhancement layer provided on the darkened light-shielding pattern layer and having surface energy of 30 dynes/cm or less, a method for manufacturing the same, and a method for forming a pattern using the film mask.

Find Patent Forward Citations

Hwang, Ji. (2021). Film mask, method for manufacturing same, and method for forming pattern using film mask (U.S. Patent No. 10969677). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10969677

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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