The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 06, 2021
Filed:
Jan. 31, 2017
Applicant:
Lg Chem, Ltd., Seoul, KR;
Inventors:
Ji Young Hwang, Daejeon, KR;
Han Min Seo, Daejeon, KR;
Nam Seok Bae, Daejeon, KR;
Seung Heon Lee, Daejeon, KR;
Dong Hyun Oh, Daejeon, KR;
Chan Hyoung Park, Daejeon, KR;
Ki-Hwan Kim, Daejeon, KR;
Ilha Lee, Daejeon, KR;
Assignee:
LG CHEM, LTD., Seoul, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/54 (2012.01); G03F 1/38 (2012.01); G03F 1/48 (2012.01); G03F 1/56 (2012.01); G03F 1/50 (2012.01); G03F 7/20 (2006.01); H01L 21/033 (2006.01);
U.S. Cl.
CPC ...
G03F 1/54 (2013.01); G03F 1/38 (2013.01); G03F 1/48 (2013.01); G03F 1/50 (2013.01); G03F 1/56 (2013.01); G03F 7/20 (2013.01); G03F 7/2014 (2013.01); G03F 7/703 (2013.01); G03F 7/7035 (2013.01); G03F 7/70791 (2013.01); H01L 21/033 (2013.01);
Abstract
The present application relates to a film mask including: a transparent substrate; a darkened light-shielding pattern layer provided on the transparent substrate; and a release force enhancement layer provided on the darkened light-shielding pattern layer and having surface energy of 30 dynes/cm or less, a method for manufacturing the same, and a method for forming a pattern using the film mask.