The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 06, 2021

Filed:

Apr. 23, 2020
Applicant:

AU Optronics Corporation, Hsinchu, TW;

Inventors:

Ssu-Hui Lu, Hsinchu, TW;

Jia-Hong Ye, Hsinchu, TW;

Kuo-Yu Huang, Hsinchu, TW;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02F 1/1333 (2006.01); G02F 1/1335 (2006.01); G02F 1/1362 (2006.01); G06F 3/041 (2006.01);
U.S. Cl.
CPC ...
G02F 1/133512 (2013.01); G02F 1/13338 (2013.01); G06F 3/041 (2013.01); G02F 1/133357 (2021.01); G02F 1/133514 (2013.01); G02F 1/136286 (2013.01); G06F 2203/04103 (2013.01); G06F 2203/04107 (2013.01);
Abstract

An opposite substrate including a substrate, first light-shielding patterns, second light-shielding patterns, a planarization layer and support members is provided. The support members are located in primary support regions and secondary support regions of the opposite substrate. The first light-shielding patterns respectively extend along a first direction, and a material of the first light-shielding patterns includes an organic material. The second light-shielding patterns respectively extend along a second direction, and a material of the second light-shielding patterns includes metal. The first light-shielding patterns and the second light-shielding patterns are respectively located at opposite sides of the planarization layer. Alternatively, the first light-shielding patterns and the second light-shielding patterns are located at the same side of the planarization layer, and the planarization layer has openings respectively overlapped with the support members located in the secondary support regions.


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