The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 06, 2021

Filed:

Dec. 13, 2018
Applicant:

Elesta Gmbh, Ostfildern (De), Zweigniederlassung Bad Ragaz, Bad Ragaz, CH;

Inventors:

Christoph Werner, Widnau, CH;

Massimo Maffioli, Malvaglia, CH;

Michael Vogel, Sargans, CH;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01V 8/20 (2006.01); F16P 3/14 (2006.01);
U.S. Cl.
CPC ...
G01V 8/20 (2013.01); F16P 3/144 (2013.01);
Abstract

A method for operating a photoelectric barrier as well as a photoelectric barrier with at least one first and one second optoelectronic machine guard. The first optoelectronic machine guard has a first transmitter and the second optoelectronic machine guard has a second transmitter and receiver unit. The transmitters of the first optoelectronic machine guard are successively activated during a run of a first cycle so as to emit a single light pulse, and the transmitters of the second optoelectronic machine guard are successively activated during a run of a second cycle so as to emit a single light pulse. The cycles occur substantially simultaneously. A duration of the first cycle is lengthened or shortened by the duration of a first phase offset ΔA and that the duration of the second cycle is lengthened or shortened by the duration of a second phase offset ΔB.


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