The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 06, 2021
Filed:
Oct. 17, 2018
Lawrence Livermore National Security, Llc, Livermore, CA (US);
General Atomics, San Diego, CA (US);
Michael Stadermann, Pleasanton, CA (US);
Salmaan H. Baxamusa, Livermore, CA (US);
William C. Floyd, III, Oakland, CA (US);
Philip E. Miller, Livermore, CA (US);
Tayyab I. Suratwala, Pleasanton, CA (US);
Anatolios A. Tambazidis, Pleasanton, CA (US);
Kelly Patricia Youngblood, Livermore, CA (US);
Chantel Aracne-Ruddle, Livermore, CA (US);
Art J. Nelson, Livermore, CA (US);
Maverick Chea, Cypress, CA (US);
Shuali Li, Fremont, CA (US);
Lawrence Livermore National Security, LLC, Livermore, CA (US);
General Atomics, San Diego, CA (US);
Abstract
A method of making large ultrathin free-standing polymer films without use of a sacrificial layer includes the steps of providing a substrate, applying a polyelectrolyte material to said substrate, applying a polymer material onto said substrate and onto said polyelectrolyte material, and directly delaminating said polymer material from said substrate and said polyelectrolyte to produce the ultrathin free-standing polymer film.