The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 06, 2021
Filed:
Nov. 27, 2018
National Taiwan University of Science and Technology, Taipei, TW;
Jeng-Ywan Jeng, Taipei, TW;
Yih-Lin Cheng, Taipei, TW;
Ding-Shyan Chen, Taipei, TW;
Zhen-You Chen, Taipei, TW;
National Taiwan University of Science and Technology, Taipei, TW;
Abstract
The present invention provides a method for reducing a drawing force in a forming process of a photocurable material by adding a radical scavenger capable of terminating free radical polymerization into a substrate for carrying the photocurable material. The method comprises: providing a mold release composition at least comprising a radical scavenger and a molding agent; and forming a mold release film from the mold release composition by curing forming or by combining with an upper surface of a plate, thereby preparing the substrate. In this way, during the light curing reaction of the photocurable material by irradiation with a light source, the radical scavenger in the upper surface of the substrate contacting with the photocurable material can react with free radicals in the photocurable material, such that the photocurable material forms an uncured layer for which light curing does not occur on the upper surface of the substrate.