The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 30, 2021

Filed:

Aug. 30, 2019
Applicants:

Psk Inc., Gyeonggi-do, KR;

Psk Holdings Inc., Gyeonggi-do, KR;

Inventors:

Je Hyeok Ryu, Gyeonggi-do, KR;

Jae Kyeong Yoo, Gyeonggi-do, KR;

Jung-Hyun Kang, Gyeonggi-do, KR;

Assignees:

PSK INC., Hwaseong-si, KR;

PSK HOLDINGS INC., Hwaseong-si, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); H01L 21/687 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67196 (2013.01); H01L 21/67017 (2013.01); H01L 21/68707 (2013.01);
Abstract

Disclosed is a substrate processing apparatus that includes an interference member for minimizing a collision between a descending flow of gas supplied by a fan unit and a gas flow directed toward a transfer space from the inside of a container.


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