The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 30, 2021
Filed:
Aug. 06, 2020
Rnd-isan, Ltd, Moscow, RU;
Isteq B.v., Eindhoven, NL;
Robert Rafilevich Gayasov, Moscow, RU;
Denis Alexandrovich Glushkov, Nieuwegein, NL;
Yurii Borisovich Kiryukhin, Moscow, RU;
Vladimir Mikhailovich Krivtsun, Moscow, RU;
Aleksandr Andreevich Lash, Moscow, RU;
RnD-ISAN, Ltd, Moscow, RU;
ISTEQ B.V., Eindhoven, NL;
Abstract
The invention relates to plasma light sources with a continuous optical discharge (COD). The light source contains a gas filled chamber with a region of radiating plasma sustained by a focused beam of a CW laser. A density of gas particles in the chamber is less than 90·10cmand a temperature of the chamber is in a range from 600 to 900 K or optionally higher. Preferably the density of gas particles is as low as possible and the temperature of the inner surface of the chamber at operation is as high as possible under providing a gas pressure in the chamber of about 50 bar or more. The technical result of the invention consists in providing COD sustaining conditions, which are optimal for achieving high stability and high brightness of the radiating plasma, in the creation on this basis of broadband light sources with ultra-high brightness and stability.