The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 30, 2021
Filed:
Mar. 27, 2019
Applicant:
Agiltron, Inc., Woburn, MA (US);
Inventors:
Jing Zhao, Andover, MA (US);
Xiangchen Che, Woburn, MA (US);
Assignee:
Agiltron, Inc., Woburn, MA (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G02B 26/08 (2006.01); B81B 7/00 (2006.01); B81B 7/02 (2006.01);
U.S. Cl.
CPC ...
G02B 26/0841 (2013.01); B81B 7/008 (2013.01); B81B 7/02 (2013.01); B81B 2201/031 (2013.01); B81B 2201/042 (2013.01); B81B 2207/015 (2013.01); B81B 2207/07 (2013.01);
Abstract
A planer silicon-based displacement amplification structure and a method are provided for latching the displacement. The displacement amplification structure may include a first actuation beam and a second actuation beam coupled to the first beam with an angle, the ends of the first beam and the second beam coupled to fixture sites, and an end of the second beam coupled to a motion actuator; a motion shutter coupled to an opposing end of the first and second beams; and a latching thermoelectric displacement structure blocking the shutter return path and have faster response than the shutter structure.