The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 30, 2021

Filed:

Apr. 12, 2017
Applicant:

Charité—universitätsmedizin Berlin, Berlin, DE;

Inventors:

Benjamin Judkewitz, Berlin, DE;

Ioannis Papadopoulos, Berlin, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 21/64 (2006.01); G02B 21/00 (2006.01); A61B 5/00 (2006.01); G02B 26/06 (2006.01);
U.S. Cl.
CPC ...
G02B 21/0072 (2013.01); A61B 5/0059 (2013.01); G02B 21/002 (2013.01); G02B 21/0056 (2013.01); G02B 21/0076 (2013.01); G02B 26/06 (2013.01);
Abstract

It is provided a method for identifying optical aberrations. The method comprising the steps of providing at least one first optical beam and a second optical beam; creating a combined beam by at least partially superimposing the first and the second optical beam; focusing the combined beam into or through a medium and detecting radiation excited in the medium by the combined beam due to nonlinear optical effects; detecting the radiation excited in the medium by the combined beam for each one of the phase positions, the spatial positions and/or the time positions of the first beam; and identifying aberrations using signals generated by a detection device for the plurality of the phase positions, the spatial positions and/or the time positions of the first beam relative to the second beam upon the detection of the radiation excited in the medium.


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