The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 30, 2021
Filed:
Mar. 10, 2016
Applicant:
Toshiba Memory Corporation, Tokyo, JP;
Inventors:
Assignee:
TOSHIBA MEMORY CORPORATION, Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
B01J 19/24 (2006.01); G01N 1/40 (2006.01); G01N 1/44 (2006.01); G01N 23/207 (2018.01); G01N 33/20 (2019.01); G01N 35/00 (2006.01); G01N 33/00 (2006.01);
U.S. Cl.
CPC ...
G01N 33/20 (2013.01); G01N 1/4044 (2013.01); G01N 1/44 (2013.01); G01N 2033/0095 (2013.01);
Abstract
An analysis pretreatment device according to an embodiment includes a chamber capable of containing an analysis object therein. A pressure reducer reduces pressure inside the chamber. An introducing part vaporizes a liquid and introduces the vaporized liquid into the chamber. A first supplier supplies water in a liquid state to the introducing part. A second supplier supplies hydrofluoric acid in a gas state to the introducing part. The introducing part introduces a mixed gas into the chamber. The mixed gas includes vaporized water, which is obtained by vaporizing water in a liquid state, and hydrofluoric acid in a gas state.