The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 30, 2021

Filed:

Jul. 02, 2018
Applicant:

Eugene Technology Co., Ltd., Yongin-Si, KR;

Inventors:

Jeong Hee Jo, Yongin-Si, KR;

Hong Won Lee, Seoul, KR;

Sung Ho Kang, Hwaseong-Si, KR;

Chang Dol Kim, Yongin-Si, KR;

Gyu Ho Choi, Yongin-Si, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/507 (2006.01); C23C 16/452 (2006.01); C23C 16/455 (2006.01); C23C 16/505 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
C23C 16/45578 (2013.01); C23C 16/452 (2013.01); C23C 16/505 (2013.01); C23C 16/507 (2013.01); H01J 37/3244 (2013.01);
Abstract

A substrate processing apparatus in accordance with an exemplary embodiments include: a first tube configured to provide a processing space in which a plurality of substrates are processed; a substrate support part configured to load the plurality of substrates in a first direction in the processing space; a plurality of gas supply parts provided with supply ports for supplying a process gas required for a process in which the substrates are processed; an exhaust part configured to communicate with the first tube and discharge process residues inside the processing space to the outside; and a plasma reaction part provided outside the first tube, and configured to decompose, with plasma, the process gas supplied from the gas supply part and provide the decomposed process gas to the processing space.


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