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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10961622 B1

PDFFull Text
Date of Patent:
Mar. 30, 2021

Filed:

Oct. 02, 2018

Gas barrier film and method of manufacturing the same

Applicant:

Toppan Printing Co., Ltd., Tokyo, JP;

Inventor:

Nao Takashima, Tokyo, JP;

Assignee:

TOPPAN PRINTING CO., LTD., Tokyo, JP;

Attorney:

Foley & Lardner LLP

Primary Examiner:

Robert S Walters, Jr

Int. Cl.
CPC ...
C23C 16/455 (2006.01); B32B 9/00 (2006.01); B32B 38/18 (2006.01); C23C 16/40 (2006.01); C23C 16/54 (2006.01); B05D 1/00 (2006.01); B05D 7/04 (2006.01); B32B 27/08 (2006.01); B32B 37/14 (2006.01); B29C 71/02 (2006.01);
U.S. Cl.
CPC ...
C23C 16/45525 (2013.01); B05D 1/60 (2013.01); B05D 7/04 (2013.01); B32B 9/00 (2013.01); B32B 27/08 (2013.01); B32B 37/144 (2013.01); B32B 38/18 (2013.01); C08J 7/08 (2013.01); C23C 16/403 (2013.01); C23C 16/405 (2013.01); C23C 16/45536 (2013.01); C23C 16/545 (2013.01); B32B 2307/422 (2013.01); B32B 2307/7242 (2013.01); B32B 2457/206 (2013.01); C08J 2367/02 (2013.01);
Abstract

A method of manufacturing a gas barrier film includes depositing an atomic layer deposition film on a surface of a plastic substrate to form a gas barrier laminate, using atomic layer deposition; depositing a curable resin layer on a support from which the layer is peelable, to form an overcoat laminate; laminating the overcoat laminate to the gas barrier laminate, with the atomic layer deposition film and the curable resin layer facing each other, and transferring the curable resin layer onto the atomic layer deposition film; curing the curable resin layer through application of heat or an active energy beam; and releasing the curable resin layer from the support.

Find Patent Forward Citations

Takashima, Nao. (2021). Gas barrier film and method of manufacturing the same (U.S. Patent No. 10961622). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10961622

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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