The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 30, 2021

Filed:

Jan. 05, 2018
Applicants:

Boe Technology Group Co., Ltd., Beijing, CN;

Ordos Yuansheng Optoelectronics Co., Ltd., Inner Mongolia, CN;

Inventors:

Zhiming Lin, Beijing, CN;

Baojun Li, Beijing, CN;

Jian Zhang, Beijing, CN;

Pu Sun, Beijing, CN;

Chun Chieh Huang, Beijing, CN;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/04 (2006.01); H01L 51/56 (2006.01); C23C 14/24 (2006.01); H01L 51/00 (2006.01);
U.S. Cl.
CPC ...
C23C 14/042 (2013.01); C23C 14/24 (2013.01); H01L 51/00 (2013.01); H01L 51/56 (2013.01);
Abstract

This disclosure relates to the field of display fabrication technologies, and discloses a fine mask support frame, a fine mask, and a method for fabricating the same. The fine mask support frame includes: a plurality of bezels surrounding a mask area, wherein adjustment openings are arranged on at least one pair of bezels arranged opposite to each other, and at least one adjustment piece is arranged on each of the adjustment openings, wherein the adjustment piece is configured to adjust a shape of a corresponding adjustment opening to thereby adjust deformation of the mask area.


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