The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 23, 2021

Filed:

Oct. 26, 2017
Applicant:

Sakai Display Products Corporation, Sakai, JP;

Inventors:

Kohichi Tanaka, Sakai, JP;

Katsuhiko Kishimoto, Sakai, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 51/56 (2006.01); H01L 51/00 (2006.01); H01L 51/52 (2006.01); H01L 27/32 (2006.01);
U.S. Cl.
CPC ...
H01L 51/56 (2013.01); H01L 51/0097 (2013.01); H01L 51/5253 (2013.01); H01L 27/3244 (2013.01); H01L 2227/326 (2013.01); H01L 2251/5338 (2013.01); H01L 2251/566 (2013.01);
Abstract

According to a flexible OLED device production method of the present disclosure, a multilayer stack () is provided which includes a glass base (), a functional layer region () including a TFT layer (A) and an OLED layer (B), and a synthetic resin film () provided between the glass base () and the functional layer region () and bound to the glass base (). In a dry gas atmosphere whose dew point is not more than −50° C., the multilayer stack () is separated into a first portion () and a second portion (), and a surface (s) of the synthetic resin film () is exposed to the dry gas atmosphere, the first portion () including the functional layer region () and the synthetic resin film (), the second portion () including the glass base (). The first portion () is transported from the dry gas atmosphere to a reduced-pressure atmosphere R, and a protection layer () is formed on the surface () of the synthetic resin film () in the reduced-pressure atmosphere R.


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