The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 23, 2021
Filed:
Dec. 21, 2018
Applicant:
S&p Global Inc., New York, NY (US);
Inventors:
Grace Bang, New York, NY (US);
Xiaomo Lu, Forest Hills, NY (US);
Zhiqiang Ma, Jersey City, NJ (US);
Azadeh Nematzadeh, Brooklyn, NY (US);
Assignee:
S&P Global Inc., New York, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 16/35 (2019.01); G06F 16/9536 (2019.01); G06Q 10/06 (2012.01); G06Q 50/00 (2012.01);
U.S. Cl.
CPC ...
G06F 16/35 (2019.01); G06F 16/9536 (2019.01); G06Q 10/0639 (2013.01); G06Q 50/01 (2013.01);
Abstract
Predicting the impact of controversial events on an entity, such as a company, can indicate the entity's ability to operate successfully in the future and optimize long-term value. This specification describes systems and methods to detect controversial events, identify the context of an event, measure the scope of the event, measure its current impact on the entity's performance, and predict the event's future impact on the entity's performance.