The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 23, 2021
Filed:
Jul. 11, 2018
Applicant:
Toshiba Memory Corporation, Minato-ku, JP;
Inventor:
Kentaro Kasa, Nagoya, JP;
Assignee:
TOSHIBA MEMORY CORPORATION, Minato-ku, JP;
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/70 (2012.01); G03F 7/20 (2006.01); G03F 1/72 (2012.01); G03F 1/60 (2012.01);
U.S. Cl.
CPC ...
G03F 7/70191 (2013.01); G03F 1/60 (2013.01); G03F 1/70 (2013.01); G03F 1/72 (2013.01); G03F 7/70125 (2013.01); G03F 7/70633 (2013.01);
Abstract
In one embodiment, a substrate processing control apparatus includes a position information acquiring module configured to acquire information about a position of a first pattern that is formed in a substrate for a photomask to change an applied stress to the substrate or a transmittance of the substrate. The apparatus further includes a position determining module configured to determine, in accordance with the information about the position of the first pattern, a position of a second pattern to be formed in the substrate to change the applied stress to the substrate or the transmittance of the substrate.