The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 23, 2021

Filed:

Nov. 14, 2018
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Michael Yu-tak Young, Cupertino, CA (US);

Ludovic Godet, Sunnyvale, CA (US);

Robert Jan Visser, Menlo Park, CA (US);

Wayne McMillan, San Jose, CA (US);

Assignee:

APPLIED MATERIALS, INC., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B29D 11/00 (2006.01); F21V 8/00 (2006.01);
U.S. Cl.
CPC ...
G02B 6/0065 (2013.01); B29D 11/0075 (2013.01); G02B 6/0036 (2013.01);
Abstract

Embodiments described herein relate to methods of fabricating waveguide structures with gratings having front angles less than about 45° and back angles less than about 45°. The methods include imprinting stamps into nanoimprint resists disposed on substrates. The nanoimprint resists are subjected to a cure process. The stamps are released from the nanoimprint resist at a release angle ϑ using a release method. The nanoimprint resists are subjected to an anneal process to form a waveguide structure comprising a plurality of gratings with a front angle α and a back angle β relative to a second plane of the surface of the substrate less than about 45°.


Find Patent Forward Citations

Loading…