The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 23, 2021
Filed:
Feb. 21, 2018
Applicant:
Ascentool, Inc., Palo Alto, CA (US);
Inventor:
George Xinsheng Guo, Palo Alto, CA (US);
Assignee:
Other;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/35 (2006.01); C23C 16/458 (2006.01); C23C 16/513 (2006.01); C23C 16/46 (2006.01); C23C 16/04 (2006.01); C23C 16/50 (2006.01); C23C 16/455 (2006.01); H01J 37/34 (2006.01); H01J 37/32 (2006.01); C23C 14/04 (2006.01);
U.S. Cl.
CPC ...
C23C 16/4587 (2013.01); C23C 14/044 (2013.01); C23C 14/352 (2013.01); C23C 16/04 (2013.01); C23C 16/042 (2013.01); C23C 16/45563 (2013.01); C23C 16/46 (2013.01); C23C 16/50 (2013.01); C23C 16/513 (2013.01); H01J 37/32715 (2013.01); H01J 37/32743 (2013.01); H01J 37/32779 (2013.01); H01J 37/32899 (2013.01); H01J 37/345 (2013.01); H01J 37/3417 (2013.01); H01J 37/3423 (2013.01); H01J 37/3435 (2013.01); H01J 37/3447 (2013.01);
Abstract
A high throughput deposition apparatus includes a process chamber, a plurality of targets that form a first closed loop in the process chamber, wherein the first closed loop includes a long dimension defined by at least a first pair of targets and a short dimension defined by at least a second pair of targets, a first substrate carrier assembly that can hold one or more substrates and configured to receive a deposition material from the plurality of targets in the first closed loop, and a transport mechanism that can move the first substrate carrier assembly along an axial direction through the first closed loop in the first process chamber.