The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 16, 2021

Filed:

Jul. 19, 2016
Applicant:

Hewlett-packard Development Company, L.p., Fort Collins, CO (US);

Inventor:

James P. Shields, Corvallis, OR (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05B 7/06 (2006.01); H05B 7/08 (2006.01); B41J 2/01 (2006.01); B41J 2/02 (2006.01); H05H 1/42 (2006.01); H05H 1/24 (2006.01); B41J 2/435 (2006.01);
U.S. Cl.
CPC ...
H05H 1/42 (2013.01); B41J 2/435 (2013.01); H05H 1/2406 (2013.01); H05H 2001/2418 (2013.01); H05H 2001/2437 (2013.01); H05H 2001/2443 (2013.01);
Abstract

The present disclosure is drawn to plasma treatment heads. In one example, a plasma head can include a dielectric barrier formed of a dielectric material. The dielectric barrier can have a treatment surface and an interior surface opposite of the treatment surface. A first electrode can be embedded within the dielectric barrier beneath the treatment surface. A second electrode can also be embedded within the dielectric barrier beneath the treatment surface and spaced laterally apart from the first electrode. A plurality of injection holes can penetrate through the dielectric plate from the interior surface to the treatment surface. The plurality of injection holes can be located between the first electrode and second electrode.


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