The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 16, 2021
Filed:
Sep. 11, 2019
Toshiba Memory Corporation, Tokyo, JP;
Tsukasa Azuma, Tokyo, JP;
Toshiba Memory Corporation, Tokyo, JP;
Abstract
According to one embodiment, a pattern forming method is disclosed. The method includes forming a guide pattern, forming a block copolymer film that covers the guide pattern and includes first and second polymers, and forming a microphase-separation pattern including first portions of the first polymer and second portions of the second polymer which are alternately arranged by subjecting the block copolymer film to microphase separation. The method further includes measuring a position of the guide pattern, the first portions or the second portions by using a scanning probe microscope, determining whether a misalignment amount of the first portions with respect to the guide pattern is within a first range, based on the measured position of the first and the guide pattern, and removing the first portions, when the misalignment amount is within the first range.