The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 16, 2021
Filed:
Aug. 09, 2019
Tcl China Star Optoelectronics Technology Co., Ltd., Guangdong, CN;
Guanxian He, Guangdong, CN;
Keyuan Liu, Guangdong, CN;
TCL CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD., Guangdong, CN;
Abstract
An application method of demura data having a uniform format includes: in step S, it is determined whether demura data having a first format is stored in a first memory; if yes, step Sis performed; if no, step Sis performed; in step S, it is checked whether the demura data having the first format is consistent with demura data having a second format and stored in a second memory; if yes, step Sis performed; if no, step Sis performed; in step S, the demura data having the first format in the first memory is read; in step S, a demura data compensation is activated; and in step S, demura data having the first format is generated, according to the demura data having the second format and stored in the second memory, and stored; step Sis performed.