The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 16, 2021

Filed:

Aug. 26, 2016
Applicant:

Hitachi, Ltd., Tokyo, JP;

Inventor:

Hironori Emaru, Tokyo, JP;

Assignee:

HITACHI, LTD., Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 9/445 (2018.01); G06F 11/34 (2006.01); G06F 8/60 (2018.01); G06F 8/71 (2018.01); G06F 9/54 (2006.01); G06F 11/30 (2006.01);
U.S. Cl.
CPC ...
G06F 11/3476 (2013.01); G06F 8/60 (2013.01); G06F 8/71 (2013.01); G06F 9/542 (2013.01); G06F 11/302 (2013.01);
Abstract

A problem to be addressed by the present invention is that, when a version update of an application has been carried out, it has not been possible to ascertain which metrics are affected. Provided is an application management system, comprising: a monitoring program, which measures a plurality of metric types in a plurality of different environments; a deployment programwhich deploys a first version and a second version of an application; and an analysis program which, on the basis of measurement values of the plurality of metric types in environments in which the first version and the second version of the application respectively operate, determine a metric type in which a difference occurs between the first version and the second version.


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