The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 16, 2021
Filed:
Dec. 14, 2018
Applicant:
National Cheng Kung University, Tainan, TW;
Inventors:
Assignee:
NATIONAL CHENG KUNG UNIVERSITY, Tainan, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 19/00 (2018.01); G05B 19/418 (2006.01); G06F 16/2457 (2019.01); G05B 23/02 (2006.01);
U.S. Cl.
CPC ...
G05B 19/41875 (2013.01); G05B 19/4184 (2013.01); G05B 19/41845 (2013.01); G05B 23/0281 (2013.01); G06F 16/24578 (2019.01);
Abstract
Embodiments of the present disclosure provide a two-phase process for searching root causes of a yield loss in a production line. In a first phase, an interaction between two process tools, that between two parameters, or that between one process tool and one parameter that is likely to cause the yield loss is identified. In a second phase, a threshold of the parameter that is likely to cause the yield loss and is obtained from the first phase is identified. In each phase, two different algorithms can be used to generate a reliance index (RI) for gauging the reliance levels of their search results.