The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 16, 2021
Filed:
May. 10, 2017
Applicant:
The Hong Kong University of Science and Technology, Hong Kong, CN;
Inventors:
Abhishek Kumar Srivastava, Hong Kong, CN;
Wanlong Zhang, Hong Kong, CN;
Vladimir Grigorievich Chigrinov, Hong Kong, CN;
Hoi Sing Kwok, Hong Kong, CN;
Assignee:
THE HONG KONG UNIVERSITY OF SCIENCE AND TECHNOLOGY, Hong Kong, CN;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02F 1/1335 (2006.01); G02F 1/13357 (2006.01); G02F 1/1337 (2006.01);
U.S. Cl.
CPC ...
G02F 1/133609 (2013.01); G02F 1/133528 (2013.01); G02F 1/133603 (2013.01); G02F 1/133621 (2013.01); G02F 2001/133614 (2013.01); G02F 2001/133715 (2013.01); G02F 2202/36 (2013.01);
Abstract
A photoaligned quantum rod enhancement film (QREF) includes: a substrate (); a photoalignment layer deposited on the substrate (); and a polymer layer deposited on the photoalignment layer, the polymer layer comprises a plurality of quantum rods, the plurality of quantum rods are configured to emit one or more wavelengths of light in response to pumping light, and are aligned to an alignment axis based on the photoalignment layer.