The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 16, 2021
Filed:
Dec. 06, 2016
Shimadzu Corporation, Kyoto, JP;
Kenji Sato, Otsu, JP;
Akihiro Nishimura, Kyoto, JP;
SHIMADZU CORPORATION, Kyoto, JP;
Abstract
An X-ray spectroscopic analysis apparatus includes: a radiation source configured to irradiate a predetermined irradiation area in the surface of a sample with an excitation beam for generating a characteristic X-ray; an analyzing crystal provided facing the irradiation area; a slit provided between the irradiation area and the analyzing crystal, the slit being parallel to the irradiation area and a predetermined crystal plane of the analyzing crystal; and an X-ray linear sensor including linear detection elements arranged in a direction perpendicular to the slit, the detection elements each having a length in a direction parallel to the slit. By detecting characteristic X-rays from different linear portions of the irradiation area for each wavelength, it is possible to perform analysis with sensitivity higher than the sensitivity of a conventional X-ray spectroscopic analysis apparatus that irradiates a point-like irradiation area with an excitation beam.