The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 16, 2021

Filed:

Nov. 15, 2016
Applicant:

Hamamatsu Photonics K.k., Hamamatsu, JP;

Inventors:

Kazuhiko Fujiwara, Hamamatsu, JP;

Yoshihiro Maruyama, Hamamatsu, JP;

Assignee:

HAMAMATSU PHOTONICS K.K., Hamamatsu, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 21/78 (2006.01); G01N 21/82 (2006.01); G01N 31/22 (2006.01);
U.S. Cl.
CPC ...
G01N 21/78 (2013.01); G01N 21/82 (2013.01); G01N 31/22 (2013.01);
Abstract

A concentration measurement method is a method for measuring a concentration of an analyte in a measurement solution containing the analyte having reducing action, and includes a mixing step of preparing a mixture solution by mixing a metal ion solution, a complexing agent, and a pH adjusting agent to prepare an intermediate mixture solution, and mixing the intermediate mixture solution and the measurement solution, a metal microstructure generation step of generating a metal microstructure on a support by reducing metal ions in the mixture solution by the reducing action of the analyte in the mixture solution, a measurement step of measuring an optical response of the metal microstructure on the support, and an analysis step of determining a concentration of the analyte in the measurement solution on the basis of a measurement result of the optical response.


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