The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 16, 2021

Filed:

Oct. 24, 2018
Applicant:

National Cheng Kung University, Tainan, TW;

Inventors:

Chen-Kuei Chung, Tainan, TW;

Yun Chen, Tainan, TW;

Chung-Yu Yu, Tainan, TW;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C25D 11/18 (2006.01); C25D 11/04 (2006.01); B01D 67/00 (2006.01); B01D 71/02 (2006.01); C25D 11/06 (2006.01);
U.S. Cl.
CPC ...
C25D 11/045 (2013.01); B01D 67/0065 (2013.01); B01D 71/025 (2013.01); C25D 11/06 (2013.01);
Abstract

A method for preparing invisible anodic aluminum oxide (AAO) patterns is revealed. The method includes a plurality of steps. First take an aluminum substrate. Then anodize the aluminum substrate for the first time to get a first anodic aluminum oxide (AAO). Next perform photolithography so that a photoresist forms a pattern on the aluminum substrate with the first AAO. Lastly anodize the aluminum substrate for the second time so that a second AAO is formed on the pattern and the pattern becomes invisible.


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