The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 16, 2021

Filed:

Jul. 05, 2018
Applicant:

Von Ardenne Asset Gmbh & Co. KG, Dresden, DE;

Inventors:

Sven Heinrich, Dresden, DE;

Michael Brandt, Coswig, DE;

Daniel Stange, Dresden, DE;

Damir Muchamedjarow, Bannewitz, DE;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/56 (2006.01); C23C 16/455 (2006.01); C23C 14/24 (2006.01); C23C 14/54 (2006.01); C23C 16/44 (2006.01);
U.S. Cl.
CPC ...
C23C 14/564 (2013.01); C23C 14/24 (2013.01); C23C 14/541 (2013.01); C23C 16/4401 (2013.01); C23C 16/455 (2013.01); C23C 16/4404 (2013.01); C23C 16/45591 (2013.01);
Abstract

A processing arrangement comprising: a process chamber comprising an upper chamber wall, a lower chamber wall and two lateral chamber walls; an insulating structure, arranged between the processing region and each of the upper chamber wall, the lower chamber wall and the two lateral chamber walls, respectively, for thermally insulating the processing region, wherein the insulating structure is configured as gas-permeable at least in sections in such a way that a process gas from the processing region can flow out of the processing region in the direction in each of the upper chamber wall, the lower chamber wall and the two lateral chamber walls, respectively, through the insulating structure; and a gas channel, arranged between the insulating structure and each of the upper chamber wall, the lower chamber wall and the two lateral chamber walls, respectively, for pumping away the process gas which flows through the insulating structure.


Find Patent Forward Citations

Loading…