The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 16, 2021

Filed:

Nov. 19, 2018
Applicant:

Toppan Printing Co., Ltd., Tokyo, JP;

Inventor:

Eiichi Higashikawa, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B32B 3/10 (2006.01); B32B 27/20 (2006.01); B32B 27/00 (2006.01); B32B 3/26 (2006.01); B32B 27/40 (2006.01); B32B 33/00 (2006.01);
U.S. Cl.
CPC ...
B32B 3/10 (2013.01); B32B 27/00 (2013.01); B32B 27/20 (2013.01); B32B 3/263 (2013.01); B32B 27/40 (2013.01); B32B 33/00 (2013.01); Y10T 428/24876 (2015.01);
Abstract

In a decorative material, a matting agent is added to, of a first gloss-adjusting layer and a second gloss-adjusting layer, one with lower gloss, where the matting agent has a particle diameter of 1.0 times or more the thickness of the gloss-adjusting layer with lower gloss. Accordingly, sufficient unevenness can be imparted to the surface of the gloss-adjusting layer; thus, glossiness does not increase in oblique observation, and low gloss can be maintained. Therefore, it is possible to provide a decorative material having a feeling of unevenness obtained by the difference in gloss that hardly changes even when observed obliquely.


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