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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10946474 B1

PDFFull Text
Date of Patent:
Mar. 16, 2021

Filed:

Sep. 10, 2018

Raster methodology, apparatus and system for electron beam layer manufacturing using closed loop control

Applicant:

Sciaky, Inc., Chicago, IL (US);

Inventors:

Scott Stecker, Willow Springs, IL (US);

Phillip E. Wollenhaupt, Crown Point, IN (US);

Assignee:

SCIAKY, INC., Chicago, IL (US);

Attorneys:

The Dobrusin Law Firm, P.C.

Bryan S. Lemanski

Primary Examiner:

Michael A Laflame, Jr

Int. Cl.
CPC ...
B23K 15/02 (2006.01); B23K 15/00 (2006.01); B23K 26/34 (2014.01); B23K 26/346 (2014.01); B33Y 70/00 (2020.01); B23K 15/06 (2006.01); B23K 26/342 (2014.01); B33Y 10/00 (2015.01); C22C 14/00 (2006.01); H01J 37/30 (2006.01); H01J 37/304 (2006.01); H01J 37/305 (2006.01); B23K 103/14 (2006.01); B33Y 50/02 (2015.01);
U.S. Cl.
CPC ...
B23K 15/0086 (2013.01); B23K 15/0093 (2013.01); B23K 15/02 (2013.01); B23K 15/06 (2013.01); B23K 26/34 (2013.01); B23K 26/342 (2015.10); B23K 26/346 (2015.10); B33Y 10/00 (2014.12); B33Y 70/00 (2014.12); C22C 14/00 (2013.01); H01J 37/304 (2013.01); H01J 37/305 (2013.01); H01J 37/3007 (2013.01); B23K 15/00 (2013.01); B23K 2103/14 (2018.08); B33Y 50/02 (2014.12);
Abstract

A method for layer-by-layer manufacturing of a three-dimensional metallic work piece, comprising the steps of: delivering a metallic feed material in a substantially solid state into a feed region; emitting an electron beam; and translating the electron beam through a first predetermined raster pattern frame in an x-y plane. The method may also include monitoring a condition of one or both of the feed region or the substrate region in real time for the occurrence of any deviation from a predetermined condition; upon detecting of any deviation, translating the electron beam through at least one second predetermined raster pattern frame in the x-y plane that maintains the melting beam power density level substantially the same as the first predetermined raster pattern frame, but alters the substrate beam power density level.

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