The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 16, 2021
Filed:
Apr. 16, 2019
Imec Vzw, Leuven, BE;
Universiteit Hasselt, Hasselt, BE;
Rajesh Ramaneti, Hasselt, BE;
Giedrius Degutis, Hasselt, BE;
Ken Haenen, Hasselt, BE;
Marlies Van Bael, Molenbeek-Wersbeek, BE;
Paulius Pobedinskas, Boncelles, BE;
IMEC VZW, Leuven, BE;
UNIVERSITEIT HASSELT, Hasselt, BE;
Abstract
In a first aspect, the present disclosure relates to a method for forming a diamond membrane, comprising: providing a substrate having an amorphous dielectric layer thereon, the amorphous dielectric layer comprising an exposed surface, the exposed surface having an isoelectric point of less than 7, preferably at most 6; seeding diamond nanoparticles onto the exposed surface; growing a diamond layer from the seeded diamond nanoparticles; and removing a portion of the substrate from underneath the diamond layer, the removed portion extending at least up to the amorphous dielectric layer, thereby forming the diamond membrane over the removed portion.