The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 09, 2021

Filed:

Dec. 06, 2018
Applicants:

Boe Technology Group Co., Ltd., Beijing, CN;

Fuzhou Boe Optoelectronics Technology Co., Ltd., Fujian, CN;

Inventors:

Zihua Zhuang, Beijing, CN;

Xi Chen, Beijing, CN;

Jiamin Liao, Beijing, CN;

Zhendian Wu, Beijing, CN;

Dahai Li, Beijing, CN;

Linlin Lin, Beijing, CN;

Gaopan Tang, Beijing, CN;

Guichun Hong, Beijing, CN;

Jin Wang, Beijing, CN;

Xinmao Qiu, Beijing, CN;

Changhong Shi, Beijing, CN;

Yaochao Lv, Beijing, CN;

Jiarong Liu, Beijing, CN;

Zongxiang Li, Beijing, CN;

Hongtao Lin, Beijing, CN;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/12 (2006.01); H01L 29/66 (2006.01); H01L 29/786 (2006.01);
U.S. Cl.
CPC ...
H01L 27/124 (2013.01); H01L 27/127 (2013.01); H01L 27/1285 (2013.01); H01L 29/66765 (2013.01); H01L 29/78669 (2013.01);
Abstract

A display substrate, a method for manufacturing the same and a display device are provided. The method includes steps of forming a common electrode line, a semiconductor pattern, and a data line on a base substrate, so that the semiconductor pattern is located between the common electrode line and the data line; and irradiating the semiconductor pattern by using light in a predetermined wavelength range from a side of the base substrate distal to the semiconductor pattern, to generate a dangling-bond defect state in a band gap of the semiconductor pattern.


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