The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 09, 2021

Filed:

Oct. 05, 2017
Applicant:

Rohm and Haas Electronic Materials Korea Ltd., Cheonan, KR;

Inventors:

Yeonok Kim, Hwaseong, KR;

Geun Huh, Hwaseong, KR;

Jong Han Yang, Hwaseong, KR;

Jin Kwon, Hwaseong, KR;

Jin Kyu Im, Hwaseong, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/075 (2006.01); G03F 7/004 (2006.01); G03F 7/023 (2006.01); C08L 83/04 (2006.01); G03F 7/022 (2006.01); G03F 7/039 (2006.01); C08G 77/04 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0048 (2013.01); C08L 83/04 (2013.01); G03F 7/0226 (2013.01); G03F 7/0233 (2013.01); G03F 7/039 (2013.01); G03F 7/0755 (2013.01); G03F 7/0757 (2013.01); C08G 77/04 (2013.01);
Abstract

The present invention relates to a photosensitive resin composition and to a cured film formed therefrom, wherein the photosensitive resin composition can improve the sensitivity by using an alcoholic solvent, along with a siloxane polymer and a quinone diazide compound conventionally used, which enhances the solubility in a developer through an interaction between the alcohol and the diazonaphthoquinone (DNQ) group in the quinone diazide compound, as well as can form a cure film having excellent film retention rate even after post-bake.


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