The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 09, 2021
Filed:
Aug. 27, 2019
Fujifilm Corporation, Tokyo, JP;
Shunya Katoh, Kanagawa, JP;
Rie Takasago, Kanagawa, JP;
FUJIFILM Corporation, Tokyo, JP;
Abstract
An object of the present invention is to provide a structure having an excellent diffuse reflectivity and a method of manufacturing a structure. The object is achieved by a structure including a plurality of reflection layers formed by fixing a cholesteric liquid crystalline phase, the reflection layers being laminated, in which in a reflection layer, a bright portion and a dark portion derived from the cholesteric liquid crystalline phase have wavy structures in a cross section, and undulations of the wavy structures of bright portions closest to each other coincide in the adjacent reflection layers; and by a method of manufacturing a structure including forming a reflection layer formed by fixing a cholesteric liquid crystalline phase, in which a bright portion and a dark portion have wavy structures, in a cross section, and forming the reflection layer on a first reflection layer by a coating method using an composition containing a liquid crystal compound and a chiral agent.