The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 09, 2021
Filed:
Nov. 08, 2017
South China Normal University, Guangdong, CN;
Shenzhen Guohua Optoelectronics Co., Ltd., Guangdong, CN;
Academy of Shenzhen Guohua Optoelectronics, Guangdong, CN;
SOUTH CHINA NORMAL UNIVERSITY, Guangzhou, CN;
SHENZHEN GUOHUA OPTOELECTRONICS CO., LTD., Shenzhen, CN;
ACADEMY OF SHENZHEN GUOHUA OPTOELECTRONICS, Shenzhen, CN;
Abstract
An electric response infrared reflection device and a preparation method thereof. The device comprises three light-transmitting conductive substrates which are oppositely arranged. Two adjacent light-transmitting conductive substrates of the three light-transmitting conductive substrates are respectively packaged to form a first adjusting area and a second adjusting area. Both the first adjusting area and the second adjusting area are filled with liquid crystal layers. Each of the liquid crystal layers comprises a mixed liquid crystal material. The mixed liquid crystal material comprises a chiral nematic phase liquid crystal, a monomer, a photoinitiator, and a chiral dopant. The spiral direction of the chiral nematic phase liquid crystal in the first adjusting area is opposite to the spiral direction of the chiral nematic phase liquid crystal in the second adjusting area, so that the total reflection of an infrared band can be implemented.