The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 09, 2021
Filed:
Dec. 26, 2017
Applicant:
Screen Holdings Co., Ltd., Kyoto, JP;
Inventors:
Yuji Tanaka, Kyoto, JP;
Chisayo Nakayama, Kyoto, JP;
Masahiko Harumoto, Kyoto, JP;
Masaya Asai, Kyoto, JP;
Yasuhiro Fukumoto, Kyoto, JP;
Tomohiro Matsuo, Kyoto, JP;
Takeharu Ishii, Kyoto, JP;
Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/56 (2006.01); H01L 21/687 (2006.01); H01L 21/67 (2006.01); C23C 16/44 (2006.01);
U.S. Cl.
CPC ...
C23C 16/56 (2013.01); C23C 16/4408 (2013.01); H01L 21/6719 (2013.01); H01L 21/67098 (2013.01); H01L 21/67109 (2013.01); H01L 21/67126 (2013.01); H01L 21/67248 (2013.01); H01L 21/68742 (2013.01);
Abstract
Disclosed is a substrate treating method for performing a heat treatment of a substrate having a treated film formed thereon in a heat treating space of a heat treating chamber. The method includes an exhaust step of performing exhaust of gas within the heat treating space, an inert gas supply step of supplying inert gas into the heat treating space, and a heat treating step of performing the heat treatment of the substrate in the heat treating space.