The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 09, 2021

Filed:

Sep. 29, 2015
Applicant:

Pryog, Llc, Attleboro, MA (US);

Inventors:

Stephanie Dilocker, Inverness, FL (US);

Joseph J. Schwab, Hattiesburg, MS (US);

Assignee:

Pryog, LLC, Fall River, MA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C07F 7/00 (2006.01); H01L 21/308 (2006.01); H01L 21/033 (2006.01);
U.S. Cl.
CPC ...
C07F 7/003 (2013.01); H01L 21/0332 (2013.01); H01L 21/3081 (2013.01); H01L 21/3086 (2013.01);
Abstract

The present disclosure relates to a process for forming a refined metal-containing unit by reducing yield impurities with acidified deionized water. Another embodiment is a composition comprising the refined metal-containing unit. Yet another embodiment is a process for forming a patterned substrate by depositing a composition comprising the refined metal-containing unit on a substrate, drying the film comprising the refined metal-containing unit, exposing the film comprising the refined metal-containing composition to a source of actinic radiation, and transferring the pattern to substrate. The disclosed embodiments are useful in producing patterned substrates by direct or indirect pattern transfer from films comprising the refined metal-containing unit.


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