The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 09, 2021

Filed:

Aug. 22, 2017
Applicant:

Dai-ichi Kogyo Seiyaku Co., Ltd., Kyoto, JP;

Inventors:

Masatake Joyabu, Kyoto, JP;

Kei Shiohara, Kyoto, JP;

Asako Ogasawara, Kyoto, JP;

Takuro Kimura, Kyoto, JP;

Chi Tao, Kyoto, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F 2/26 (2006.01); C08F 2/30 (2006.01); B01F 17/00 (2006.01); C08L 71/02 (2006.01); C09D 7/45 (2018.01); C09J 11/08 (2006.01); D21H 17/53 (2006.01); D21H 17/36 (2006.01); D21H 21/08 (2006.01); C08F 2/24 (2006.01); C08K 5/06 (2006.01); C08F 20/00 (2006.01);
U.S. Cl.
CPC ...
B01F 17/0092 (2013.01); B01F 17/0028 (2013.01); C08F 2/24 (2013.01); C08F 2/26 (2013.01); C08F 20/00 (2013.01); C08K 5/06 (2013.01); C08L 71/02 (2013.01); C09D 7/45 (2018.01); C09J 11/08 (2013.01); D21H 17/36 (2013.01); D21H 17/53 (2013.01); D21H 21/08 (2013.01); C08L 2201/54 (2013.01); C08L 2205/025 (2013.01); C08L 2205/03 (2013.01);
Abstract

The polymerization stability and the chemical stability and the water resistance of resin films are improved. A surfactant composition according to an embodiment contains a surfactant (A) represented by general formula (1) and an anionic surfactant (B) having a hydrophobic group different from that of the surfactant (A). Rrepresents an alkyl group with 8 to 14 carbon atoms, A represents an alkylene group with 2 to 4 carbon atoms, and n representing an average number of moles of an oxyalkylene group added represents 1 to 100.


Find Patent Forward Citations

Loading…