The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 09, 2021

Filed:

Nov. 16, 2018
Applicant:

National Taiwan University, Taipei, TW;

Inventors:

Kuo-Lun Tung, Taipei, TW;

Allen Huang, Taipei, TW;

Liang-Hsun Chen, Taipei, TW;

Yi-Rui Chen, Taipei, TW;

Chien-Hua Chen, Taipei, TW;

Che-Chen Hsu, Taipei, TW;

Feng-Yu Tsai, Taipei, TW;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01D 61/36 (2006.01); B01D 61/14 (2006.01); B01D 69/10 (2006.01); B01D 69/12 (2006.01); B01D 71/02 (2006.01); B01D 71/34 (2006.01); B01D 67/00 (2006.01); C02F 1/44 (2006.01); C02F 103/08 (2006.01);
U.S. Cl.
CPC ...
B01D 61/364 (2013.01); B01D 61/147 (2013.01); B01D 67/0079 (2013.01); B01D 67/0088 (2013.01); B01D 69/10 (2013.01); B01D 69/12 (2013.01); B01D 71/021 (2013.01); B01D 71/022 (2013.01); B01D 71/024 (2013.01); B01D 71/34 (2013.01); C02F 1/447 (2013.01); C02F 2103/08 (2013.01);
Abstract

The present invention provides an omniphobic membrane and application thereof. The omniphobic membrane comprises a porous substrate which has a pore size between 0.4 and 2 μm, a top coat, and an interface layer between the porous substrate and the top coat, and the omniphobic membrane has a carbon/silicon ratio between 40 and 60, and a hierarchical re-entrant structure. Furthermore, both of a process for fabricating the omniphobic membrane and a method for desalination of a liquid by membrane distillation are provided in the present invention.


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