The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 09, 2021
Filed:
Oct. 03, 2017
Dow Toray Co., Ltd., Tokyo, JP;
Dow Silicones Corporation, Midland, MI (US);
Haruhiko Furukawa, Ichihara, JP;
John Bernard Horstman, Midland, MI (US);
Tomohiro Iimura, Ichihara, JP;
Tadashi Okawa, Ichihara, JP;
Steven Swier, Midland, MI (US);
Dow Silicones Corporation, Midland, MI (US);
Dow Toray Co., Ltd., Tokyo, JP;
Abstract
Provided is a resin-linear organopolysiloxane block copolymer which has a high degree of freedom in formulation due to excellent compatibility with other materials, in addition to exhibiting excellent film forming properties and followability of a film, while the stickiness of a film is suppressed. The resin-linear organopolysiloxane block copolymer has: a resin structure (A1) block that has siloxane units represented by RSiO(wherein Rrepresents a monovalent organic group, a hydroxyl group, or an alkoxy group having 1 to 6 carbon atoms) and SiO; and a linear structure (A2) block represented by (RSiO)(wherein n represents a number of 5 or more while R represents an alkyl group, a fluoroalkyl group, or an aryl group) in each molecule. The resin structure (A1) and the linear structure (A2) are linked to each other by an Si—O—Si bond, and an Si atom bonded to the resin structure (A1) constitutes an RSiOunit.